UDC 66.088

AN OVERVIEW OF HIGH-ASPECT PROCESS SILICON ETCHING

Zapevalin Alexander Ivanovich
Penza State University
Postgraduate of "Instrument making" department

Abstract
This article provides an overview of high-Aspect silicon etching processes for the production of micro electromechanical systems (MEMS). Reviewed suitable for these processes, plasma systems configuration. The article describes cryogenic process and Bosch-process silicon etching.

Keywords: Bosch-process, Bosch-процесс, cryogenic process, DRIE, RIE


Article reference:
An overview of high-Aspect process silicon etching // Modern technics and technologies. 2014. № 6 [Electronic journal]. URL: https://technology.snauka.ru/en/2014/06/3970

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