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UDC 66.088
LAG EFFECTS IN THE PLASMA ETCHING OF SILICON
Zapevalin Alexander Ivanovich
Penza State University
Postgraduate of "Instrument making" department
Penza State University
Postgraduate of "Instrument making" department
Abstract
The article discusses the Lag-effect occurring in the plasma-chemical etching process high-Aspect trenches of varying widths. Are some ways to minimize the influence of this effect on the process. Discusses the role of pressure and cycle times of etching / deposition on the Lag-effect.
Keywords: Bosch-process, Bosch-процесс, Lag effect.
Article reference:
Lag effects in the plasma etching of silicon // Modern technics and technologies. 2014. № 6 [Electronic journal]. URL: https://technology.snauka.ru/en/2014/06/3972
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