Author: Александр Запевалин

Author's name: Запевалин Александр

Author's website: http://vk.com/id7667329

Articles of the author in journal «Modern technics and technologies»

Lag effects in the plasma etching of silicon

№ 6 June 2014

An overview of high-Aspect process silicon etching

№ 6 June 2014

Articles of the author in journal «Modern Scientific Researches and Innovations»

Zapevalin A.I. Overview of gas-phase chemistry used for plasma chemical etching Si, SiO2 and Si3N4.

June, 2014

Zapevalin A.I. Overview of gas-phase chemistry for dry etching semiconductor compounds

June, 2014