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UDC 66.088
AN OVERVIEW OF HIGH-ASPECT PROCESS SILICON ETCHING
Zapevalin Alexander Ivanovich
Penza State University
Postgraduate of "Instrument making" department
Penza State University
Postgraduate of "Instrument making" department
Abstract
This article provides an overview of high-Aspect silicon etching processes for the production of micro electromechanical systems (MEMS). Reviewed suitable for these processes, plasma systems configuration. The article describes cryogenic process and Bosch-process silicon etching.
Keywords: Bosch-process, Bosch-процесс, cryogenic process, DRIE, RIE
Article reference:
An overview of high-Aspect process silicon etching // Modern technics and technologies. 2014. № 6 [Electronic journal]. URL: https://technology.snauka.ru/en/2014/06/3970
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