Articles by keyword «Реактивно-ионное травление»

Articles in journal «Modern technics and technologies»

An overview of high-Aspect process silicon etching

№ 6 June 2014

Articles in journal «Modern Scientific Researches and Innovations»

Zapevalin A.I. Overview of gas-phase chemistry used for plasma chemical etching Si, SiO2 and Si3N4.

June, 2014